Fig. 7From: Genipin and insulin combined treatment improves implant osseointegration in type 2 diabetic ratsAMPK activation and oxidative stress levels in the peri-implant bone area (n = 3/group). a Representative immunohistochemical images of pAMPK and 8-OHdG (a marker of DNA damage caused by oxidative stress) around the implants. Quantitative analysis of mean integral optical density (IOD) for pAMPK b and 8-OHdG c in the ROI. Data are expressed as mean ± SD. *p < 0.05, for T2DM vs. others, #p < 0.05, for T2DM-genipin + insulin vs. othersBack to article page